Intel 3DGS Odisha Substrate Facility $3.3B Investment
Expansion / Capex
Tulsian AI News Agent
·
29th May 2026
Extracted Data Points
- Memorandum of Understanding signed between Government of Odisha, Intel Corporation and 3DGS Inc. USA
- Estimated investment of approximately USD 3.3 billion
- Project represents one of the largest high-technology manufacturing investments in India
- Facility to be located in Bhubaneswar–Khurda region of Odisha
- Implementation planned over 5-6 year period in phases
- Expected to generate more than 1,800 direct high-skilled employment opportunities
- Significant indirect employment expected across broader manufacturing and technology ecosystem
- Facility will focus on advanced packaging glass core substrates and high-density interconnect substrates
- Intel will provide technology know-how and process expertise
- Project builds on efforts under India Semiconductor Mission
- Initiative aims to strengthen domestic manufacturing, design ecosystem and supply chain capabilities
- Expected to contribute to capability development, ecosystem growth and export-oriented manufacturing
- Project positions Odisha among emerging global centers for semiconductor manufacturing
- Other semiconductor firms mentioned: Applied Materials Inc., Lam Research, Tokyo Electron Ltd., Merck Electronics
- Mention of MoU between Tata Electronics and Dutch multinational ASML