MATCH Act Blocks Lithography Exports to China

The U.S. Congress introduced the MATCH Act, imposing an absolute ban on selling immersion DUV lithography tools to China.
The bill designates SMIC, CXMT, YMTC, Hua Hong and Huawei as covered facilities, subject to service bans and U.S. personnel prohibitions.
It forces allied nations Netherlands and Japan to align export controls with U.S. standards within 150 days, eliminating licensing pathways.
Analysts say the act could cap China’s advanced chipmaking capacity at current levels and push it toward domestic lithography tools.